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As outlined in our previous post, partial design claiming in China continues to be a moving target, as variations in the interpretation of partial design claims persist among Chinese examiners. As of this writing, the Chinese National Intellectual Property Administration (CNIPA) has still not yet released formal guidelines or recommendations detailing partial claiming that is and is not acceptable after partial claiming in Chinese design patents became permitted on June 1, 2021. Still, trends have begun to emerge in some aspects of partial claim interpretation with respect to design titles, independent and complete design units, surface indicia and patterns, dividing lines, and simple geometric shapes. This post provides an update regarding the interpretation of independent and complete design units for partial design claims and offers guidance for protecting articles of varying sizes. Continue Reading The Moving Target of “Complete Design Units” in Chinese Law

As outlined in our previous post, securing a partial design claim in China is akin to hitting a moving target, as the interpretation of partial design claims in China has varied among cases and examiners.  Since the rule change allowing partial claiming for Chinese design patents took effect on June 1, 2021, the Chinese National Intellectual Property Administration (CNIPA) has still not yet released formal guidelines detailing what is and is not permitted.  However, certain patterns have emerged from the tranche of partial design claims that have been refused or allowed so far, especially regarding design titles, independent design units, patterns/surface indicia, unconnected claims, dividing lines, and simple geometric shapes.  From these patterns, there are several guideposts that applicants can use to navigate the uncertain waters of partial design claiming until a formal statement from the CNIPA is released.Continue Reading The Moving Target of Partial Design Protection Under Chinese Law

As outlined in our previous post, on June 1, 2021 the Fourth Amendment to the Chinese Patent Law came into effect, allowing partial claiming in design patent applications.  Until this past May, examination of most Chinese partial claim design patent applications had been held up by the China National Intellectual Property Administration (“CNIPA”), since the CNIPA had not published formal Examination Guidelines for partial design claiming.  While formal Examination Guidelines have still not been published, the CNIPA has recently been issuing Office actions rejecting certain partial designs for failing to form a “relatively independent area” or a “relatively complete design unit” of a product.  Since unclaimed broken lines can only be converted to solid lines (and vice versa) within two months from the Chinese filing date, a rejection indicating that the design fails to form a relatively independent area or a relatively complete design unit on a product can possibly mature into an incurable defect.Continue Reading Navigating Partial Design Rejections in China

On October 17, 2020, the Chinese Legislature passed the Fourth Amendment to the Chinese Patent Law, which will come into effect on June 1, 2021. As discussed in our previous post, the Fourth Amendment included several updates that help move Chinese Design Patent Law toward harmonization with the laws of most major markets.  As June 1st quickly approaches, the article below highlights and expands upon some of the major updates coming to Chinese Design Patent Law.
Continue Reading A Quick Dive Into the Upcoming Changes to Chinese Design Patent Law

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The China National Intellectual Property Administration (CNIPA) has recently published a Fourth Revision to the patent laws of the People’s Republic of China, and included in those revisions are several updates that help move Chinese design patent law towards harmonization with the laws of most other major markets. In particular, the following revisions—which will come into effect on June 1, 2021—are the most relevant for Chinese design patent applicants and design patent holders:Continue Reading New Revisions to Chinese Patent Law Increase Design Patent Harmonization